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Silicon Sputtering TargetSpecificationsPurity: 5N (99.999 wt%)Relative Density: 2.33g/cm3Type: polycrystalline/ monocrystallineProduction Method: CZ/CastingResistivity: max. 0.2ohm/cmSize: max. 300mm x 150mm x (6~30)mmDopant (PPM)ElementNaLiCaMgCuCdPbNiZnMnBAgFeMoAl≤ ppm0.50.50.50.50.50.50.50.50.50.580.50.50.50.5Silicon Sputtering Target
2017-01-18 01:47 Views:68
Price:Negotiable
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Company name:Xiamen Sunny Optoelectronic Technology Co., Ltd.
Status:[Offline] [Send message] [Chat]
Business contact:Miki Zhang(Mr.)
Telphone:
Area: Caribbean Region-Bermuda
Zip:361101
Status:[Offline] [Send message] [Chat]
Business contact:Miki Zhang(Mr.)
Telphone:
Area: Caribbean Region-Bermuda
Zip:361101