1.      Apply to coating transparent conductive film on TN, STN, TP,CF or resistive screen and capacitive screen. It can also coatfront electrodes and back electrodes on thin film solar cell glasssheet etc.

2.      Size of coated substrate: 400*500, 550*670, 1100*1400,2200*2800

3.      Equipment main parts:

a)        Vacuum chamber: vertical chamber with cooling water outside,made of 304 stainless steel;

b)       Vacuum system: molecular pumping system;

c)        Coating system: planar or rotary cathode with DC, MFmagnetron sputtering power supply, closed loop controlsystem;

d)       Heating system: stainless steel tubular heater to make sureheating uniformity;

e)        Charging system: high precision gas mass flowmeter;

f)        Electric control system: industrial controller or PLC withindependent intellectual property rights Chinese OA auto controlsofteware