Suitabel for 125*125 156*156 polysilicon's etching and cleaning

Wafer conveyed inside conveyance crate(patent pending)which avoid wafer breakage effectively.

6 or 8 channel up to 1440 to 1920 PCS/hour

Etching and cleaning processed inside channel with sealed cover and ventilation system to avoid overflow of acid and alkali gas.

Large surface heat exchanger ensures etching liguid at 10 centagrate

Whole set structure is compact and easy for maintenance