- ITO target, AZO target,IGZO target
- 2017-01-17 18:41
- High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3,Ni2O3, Cr2O3, ZnO, ZnS, CdS
- Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In target
- 2017-01-17 18:41
- High pure metal sputtering target:Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn,
- Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag
- 2017-01-17 18:41
- High pure metal sputtering target:Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn,
- ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3
- 2017-01-17 18:41
- ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. other compounds vacuum coating materials.For complex film,
- ITO target, AZO target,IGZO target, MgO, Y2O3 target
- 2017-01-17 18:41
- High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3,Ni2O3, Cr2O3, ZnO, ZnS, CdS
- SiO2, SiO, high pure Silicon, Si target, Si coating material
- 2017-01-17 18:41
- Oxide: SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials.fluoride: Nb
- SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5 coatings
- 2017-01-17 18:41
- SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials.For complex film, c
- Ceramic Sputtering Target
- 2016-10-30 17:16
- (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
- vacuum evaporation materials
- 2016-10-06 06:31
- plate: complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperatu
- FPD Sputtering Targets
- 2016-10-06 04:35
- (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
- Magnetron sputtering target
- 2016-10-06 04:35
- Magnetron sputtering targetCNM could provide high quality target material for the field of electrical and semiconductor